prof. Petr Vašina, Ph. D.
Professor (Plasma Physics), Director of the DPPT, Head of the Research Program of the CEPLANT RD Center.
Employees
doc. Pavel Souček, Ph.D.
Associate Professor
Research and development of new types of materials, analysis of deposition process, preparation and analysis of coating for industrial partners
doc. Jaroslav Hnilica, Ph.D.
Associate Professor
Space and time resolved diagostics of plasma. Study of plasma instabilities.
Peter Klein, Ph.D.
Researcher
HiPIMS plasma diagnostic (OES, high-speed cameras, probes)
Pavel Ondračka, Ph.D.
Researcher
Ab-initio calculations of coating structure and properties
Richard Gaetan Paul Drevet, Ph.D.
Researcher
Preparation and analysis of ceramic coatings
Jaroslav Ženíšek, Ph.D.
Researcher
Ab-initio calculations of coating structure and properties
Matej Fekete, Ph.D.
Researcher
Research and development of new types of materials, diagnostics of the deposition process.
Tereza Schmidtová, Ph.D.
Researcher
Preparation and analysis of protective coatings
Students
Sahand Behrangi, M.Sc.
Ph.D. student
Industrial deposition and characterization of ternary nitride thin films
Mgr. Martin Učík
Ph.D. student
Deposition process based on pulsed arc synchronised with substrate bias for deposition of AlTiN and AlCrN coatings.
Mgr. Martin Ondryáš
Ph.D. student
Comprehending the multipulse HiPIMS process, synthesis and characterisation of deposited coatings
Mgr. Tomáš Rada
Ph.D. student
Industrial deposition of thin films in conditions of enhanced sputtered species ionisation
Mgr. Lukáš Vrána
Ph.D. student
Investigation of high entropy stabilised nitrides prepared by magnetron sputtering
Bc. Terézia Halamová
master student
Effect of spokes on thin film deposition
Jakub Motl
bachelor student
Characterisation of TiAlON coatings prepared by high power impulse magnetron sputtering technique
Tatiana Pitoňáková
bachelor student
Preparation of high entropy alloy thin film oxides
Adam Vyžďura
bachelor student
Determination of the absolute number density of sputtered species during the magnetron sputtering process